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Research

Research

플라즈마 기술연구 이미지

Plasma Fundamental Technology

Fundamental plasma technology is invisible like tree roots, but it is inherent in plasma core and convergence technology, and forms the basis of plasma technology competitiveness. From the atomic and molecular characteristics of raw materials (gas, liquid, solid) to the generation characteristics of plasma, we investigate the principles of generating various plasma-material reactions through the measurement/analysis/interpretation/prediction of plasma.

Research Topics

  • 01
    Research on atomic, molecular, and optical properties

    The study of physical/chemical properties and physical/chemical reactions of atoms and molecules to understand the process by which matter is transformed into a plasma state

  • 02
    Plasma - material interaction

    A study to understand phenomena such as inorganic surface modification, structure modification and synthesis of organic compounds, sterilization of harmful microorganisms and activity of useful microorganisms using plasma

  • 03
    Plasma modeling and simulation

    A study to analyze and predict generated plasmas based on the device, and implemented through computational simulation to analyze plasma devices and processes

  • 04
    Diagnosis and analysis of plasma characteristics

    A study to understand the physical/chemical properties of plasma sources

  • 05
    Research on intelligent plasma process equipment
    * Supervised research of Plasma E. I. Convergence Research Center Program Project

    Development of technology to actively control the process by collecting and analyzing big data containing process information from semiconductor plasma process equipment in real time, diagnosing the condition by itself, and recognizing and judging changes

    • Supervised research of NST Convergence Research Center Program Project

    Name of Research GroupFuture-leading type (Plasma E. I. Convergence Research Center)

    Title of ProjectDevelopment and demonstration of intelligent technology for semiconductor plasma processing equipment

    Period of ProjectNovember 1, 2020 ~ October 31, 2026(6 years)

    Budget of Project43.96 billion KRW

    Contents https://www.nst.re.kr/nst/work/02_01.jsp#link01https://www.nst.re.kr/nst/popup/popup_work_Plasma.jsp

Research Equipment

전자-분자 총산란단면적 측정 장치 이미지

전자-분자 총산란단면적 측정 장치 Total Scattering Cross Section System

전자- 바이오 분자 충돌 측정 장치 이미지

전자- 바이오 분자 충돌 측정 장치 Electron-Biomolecule Interaction System

플라즈마 상태 물성 측정 시스템 I (저압)  이미지

플라즈마 상태 물성 측정 시스템 I (저압) Plasma Diagnostic System I (Low pressure)

플라즈마 상태 물성 측정 시스템 II (대기압) 이미지

플라즈마 상태 물성 측정 시스템 II (대기압) Plasma Diagnostic System II (atmospheric pressure)

플라즈마 시뮬레이터 이미지

플라즈마 시뮬레이터 Plasma Simulator

플라즈마물성데이터베이스 이미지

플라즈마물성데이터베이스 Plasma Properties Database

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